| 摘要 |
PROBLEM TO BE SOLVED: To provide a transparent electrode thin film manufacturing method capable of manufacturing a transparent electrode thin film having consistent film thickness without any limitation to the configuration of an optical system or a film deposition apparatus by a simple device. SOLUTION: When the transparent electrode thin film 2 is deposited in a transparent electrode thin film deposition chamber 10, the deposited transparent electrode thin film 2 is transferred to a film thickness measurement chamber 20, a surface of the transparent electrode thin film 2 is irradiated with monochromatic light in the film thickness measurement chamber 20, the reflecting intensity of the monochromatic light is measured to calculate the film thickness of the transparent electrode thin film 2, and the calculated film thickness is fed back to the film deposition condition of the transparent electrode thin film 2. COPYRIGHT: (C)2005,JPO&NCIPI
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