IMPRINTING METHOD FOR MAKING PHOTONIC STRUCTURES

摘要

Photonic crystal structures are made by a method including steps of providing a substrate (S10), depositing a multilayer stack of substantially identical planar layers (S20), each planar layer comprising two or more sublayers, depositing (S50) and patterning (S60) a layer of imprintable material by imprinting, and etching a regular array of openings through the multilayer stack (S70).