发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a highly reliable semiconductor device and its manufacturing method. <P>SOLUTION: A resin 30 is provided between a wiring substrate 10 with a wiring pattern 12 and a semiconductor chip 20 which has a plurality of electrodes 22 and is mounted on the wiring substrate 10 so that the electrode 22 comes into contact with the wiring pattern 12, and is hardened at a temperature lower than a boiling point of the resin 30 until the hardening reaction rate is 80% or more. Thereafter, the electrode 22 and the wiring pattern 12 are subjected to eutectic alloy junction. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005203558(A) 申请公布日期 2005.07.28
申请号 JP20040008227 申请日期 2004.01.15
申请人 SEIKO EPSON CORP 发明人 IMAI TAKAHIRO
分类号 H01L21/00;H01L21/48;H01L21/56;H01L21/58;H01L21/60 主分类号 H01L21/00
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