| 摘要 |
<P>PROBLEM TO BE SOLVED: To restrain the falling of a resist film of an upper layer in a multilayer resist process. <P>SOLUTION: The method comprises a process for forming an application type insulating film on a processing substrate, a process for supplying a cleaning liquid to the application type thin film for cleaning the application thin film, a process for forming a photosensitive film on the application type thin film, a process for casting an energy beam on a prescribed position of the photosensitive film for forming a latent image in the photosensitive film, a process for developing the photosensitive film for forming a photosensitive film pattern based on the latent image, and a process for processing the application type insulating film by using the photosensitive film pattern as a mask. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
