发明名称 MULTI-BEAM EXPOSURE APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide multi-beam exposure apparatus that can measure light intensity data such as light intensity distribution for adjusting shading or an exposure level in scanning exposure using a multi-beam emitted from a spatial light modulator. <P>SOLUTION: An opening plate 78 disposed on an exposure surface intercepts light that is not an object of the measurement of light intensity data at a spatial light modulator, and allows an exposure beam 48 corresponding to a pixel as the object of the measurement to pass through the plate using an opening 80 pierced in the opening plate 78. The opening 80 in the opening plate 78 is moved by a feeding mechanism in a cross direction to a scanning exposure direction. For the exposure beam 48 that has passed through the opening 80, light intensity distribution is measured by a light receiving element 86. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005203697(A) 申请公布日期 2005.07.28
申请号 JP20040010730 申请日期 2004.01.19
申请人 FUJI PHOTO FILM CO LTD 发明人 FUKUDA TSUYOSHI
分类号 B41J2/46;B41J2/465;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 B41J2/46
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