发明名称 PLOTTING METHOD, PLOTTING APPARATUS, DEVICE AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a plotting apparatus in which the precision of a liquid droplet to be landed on a substrate from each of discharge heads can be improved by correcting a relative position of each of discharge heads to the substrate even when an error is produced at the work of assembling a plurality of discharge heads. SOLUTION: This method for plotting a pattern by constituting the plurality of discharge heads integrally and discharging the liquid droplet toward the substrate from each of discharge heads comprises a preliminary liquid droplet discharging step S102 to discharge the liquid droplet from each of discharge heads toward a standard plate on which a plurality of target positions of the liquid droplet to be landed are specified, detection steps S103-S105 to detect a positional deviation between a target position and a liquid droplet-landed position, an error calculating step S106 to calculate a relative position error of each of discharge heads to the standard plate on the basis of the detected positional deviation and correction steps S107, S123 to change the relative position of each of discharge heads to the substrate one by one on the basis of the calculated relative position error when the liquid droplet is discharged toward the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005199225(A) 申请公布日期 2005.07.28
申请号 JP20040010420 申请日期 2004.01.19
申请人 SEIKO EPSON CORP 发明人 NAGAE NOBUAKI
分类号 B41J2/01;B05C5/00;B05C11/00;B05D1/26;B05D3/00;B05D7/00;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):B05D3/00 主分类号 B41J2/01
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