| 摘要 |
PROBLEM TO BE SOLVED: To fabricate a large area stamp for a nanoimprint lithography using a small stamp, after fabricating the small stamp. SOLUTION: The fabricating method of the large area stamp is comprised of vapor-depositing a polymer thin film on a substrate (S111), coating a resist material on the polymer thin film (S112), and performing an imprint process locally using the first small stamp on the resist (S113). The method is further comprised of executing repetitively a printing process while moving the first stamp (S114), and forming a resist pattern on the whole substrate (S115). The method is furthermore comprised of removing a residual layer through etching, after forming the resist pattern over the whole substrate, patterning the polymer thin film (S116), removing the resist coated on the polymer thin film, and completing the second large area stamp (S117). COPYRIGHT: (C)2005,JPO&NCIPI
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