发明名称 Immersion lithography fluids
摘要 Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 248 nm are disclosed herein.
申请公布号 US2005161644(A1) 申请公布日期 2005.07.28
申请号 US20040764227 申请日期 2004.01.23
申请人 ZHANG PENG;BUDHLALL BRIDGETTE M.;PARRIS GENE E.;BARBER LESLIE C. 发明人 ZHANG PENG;BUDHLALL BRIDGETTE M.;PARRIS GENE E.;BARBER LESLIE C.
分类号 G03F7/20;(IPC1-7):G03B11/00 主分类号 G03F7/20
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