发明名称 MANUFACTURING METHOD FOR MAPPING TYPE ELECTRON MICROSCOPE AND MICRO DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a mapping type electron microscope capable of improving resolution by lessening the occurrence of a blur by the coulomb effect. SOLUTION: The shape of a lighting beam 1 at a crossover position of an objective electro-optical system is a doughnut-like shape (bracelet-like shape), and generated electrons 2' pass through a hole part of the doughnut-like shape. Therefore, the coulomb effect between the lighting beam 1 and the generated electrons 2' can be small, so that the blur of an image can be made small. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005203162(A) 申请公布日期 2005.07.28
申请号 JP20040006423 申请日期 2004.01.14
申请人 EBARA CORP;NIKON CORP 发明人 NIN TAKEAKI
分类号 H01L21/66;H01J37/29;(IPC1-7):H01J37/29 主分类号 H01L21/66
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