| 摘要 |
An aspect of the present invention includes a method for patterning a workpiece. Said method including the actions of coating said workpiece with a layer sensitive to a writing wavelength of an electromagnetic radiation source, placing said workpiece on a workpiece stage in a lithographic printer, said printer having a reticle or a mask, with at least a first and a second area with essentially equal patterns, disposed between said radiation source and said workpiece, patterning at least a part of said layer sensitive to said writing wavelength of said electromagnitic radiation source by illuminating said mask or reticle with at least two pulses of said electromagnetic radiation, wherein said first and second areas on said mask or reticle are superimposed on the same area of the workpiece. Other aspects of the invention are reflected by the detailed decription, figures and claims. |
