PROBE FOR PLASMA DENSITY INFORMATION MEASUREMENT, MOUNTING FIXTURE FOR PLASMA DENSITY INFORMATION MEASUREMENT, PLASMA DENSITY INFORMATION MEASUREMENT METHOD, ITS DEVICE, PLASMA TREATMENT METHOD AND ITS DEVICE
摘要
<P>PROBLEM TO BE SOLVED: To provide a probe for plasma density information measurement capable of preventing abnormal discharge to stably implement a process. <P>SOLUTION: When this measurement probe 7 is inserted into a chamber 1 in order to measure plasma density information, one end (tip) 17a on the insertion side of a dielectric member 17 is formed into a planar shape so that the one end 17a is nearly flush with an inside wall 1b of the chamber 1 in the insertion part; and the measurement probe 7 is equipped with a circumferential surface with a first conductor 18 covering the dielectric member brought into contact with the inside wall of an insertion hole 1A of the chamber 1 so as to fit the measurement probe 7 to the insertion hole 1A. By structuring the probe like that, the insertion hole 1A is closed by the circumferential surface of the first conductor 18 in insertion; abnormal discharge can be eliminated by preventing an electric field in the chamber 1 from flowing through the outside wall 1a of the chamber 1 through the insertion hole 1A; and the process can be stably implemented without hindering processes such as measurement of plasma density information and plasma treatment. <P>COPYRIGHT: (C)2005,JPO&NCIPI
