发明名称 |
PATTERN TRANSFER METHOD |
摘要 |
PROBLEM TO BE SOLVED: To improve the resolution of an exposure pattern without redesigning an optical control element and lens relating to a pattern transfer method. SOLUTION: Transfer data 1 are inputted to the optical control element and the transfer pattern consisting of effective pixel regions 2 in a two-dimensional array form formed by the optical control element is projected onto a substrate. At the time of the pattern transfer method using a pattern projector, the substrate and the pattern projector are relatively moved and the sequential exposure is carried out n<SP>2</SP>times by shifting the transfer data 1 by as much as 1/n spacing of the length on the side of the effective pixel region 2 constituting the transfer data 1 relating to the one transfer pattern 3 when n is defined as an integer. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005202311(A) |
申请公布日期 |
2005.07.28 |
申请号 |
JP20040010798 |
申请日期 |
2004.01.19 |
申请人 |
KUMAMOTO UNIV;KUMAMOTO TECHNOLOGY & INDUSTRY FOUNDATION |
发明人 |
MORIMOTO TATSURO;NAKADA AKIRA;HARA KOICHI |
分类号 |
G02F1/13;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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