发明名称 CHARGED PARTICLE BEAM SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam system which obviates the generation of an electric discharge between a differential exhaust block and an object to be irradiated with a beam. SOLUTION: The charged particle beam system is equipped with a charged particle optical lens barrel 1, a stage 17 on which an irradiation object 2 is placed under the charged particle optical lens barrel, and the differential exhaust block 17 which is arranged at the end of the charged particle optical lens barrel 1 in order to exhaust the air in the gap between the charged particle optical lens barrel and the irradiation object 2. wherein the differential exhaust block 17 is formed of an insulating material and the surface facing the outer peripheral surface at the end of the charged particle optical lens barrel of the exhaust block 17 and the surface facing the irradiation object 2 are coated with metallic films 33 and 34 and the surface between both surfaces is coated with a high-resistance member film 35. The metallic film 33 facing the end of the charged particle optical lens barrel 1 is kept at the same potential as the potential of the end of the charged particle optical lens barrel 1 and the metallic film 34 facing the irradiation object 2 is kept at the same potential as the potential of the irradiation object 2. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005201944(A) 申请公布日期 2005.07.28
申请号 JP20040005226 申请日期 2004.01.13
申请人 SONY CORP;JEOL LTD 发明人 AKI YUICHI;MUTO KOICHI;MATSUMOTO ATSUSHI;MIYOKAWA TOSHIAKI
分类号 G03F7/20;G11B7/26;(IPC1-7):G03F7/20 主分类号 G03F7/20
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