发明名称 Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same
摘要 A position detecting system including a detecting system for detecting positions, at different points on a surface of a reticle having a predetermined pattern formed thereon, with respect to a direction substantially perpendicular to the reticle surface, wherein the detecting system includes a light projecting portion for directing light from a light source to the reticle surface and a light receiving portion for receiving reflection light from the reticle surface, and wherein the angle of incidence of light from the light projecting portion, being incident on the reticle surface, is not less than 45 degrees.
申请公布号 US2005161615(A1) 申请公布日期 2005.07.28
申请号 US20050505997 申请日期 2005.04.08
申请人 MAEDA KOHEI;MIURA SEIYA 发明人 MAEDA KOHEI;MIURA SEIYA
分类号 G01B11/00;G01B11/24;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G01N21/00 主分类号 G01B11/00
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