A metal chelating composition having the formula: €ƒ€ƒ€ƒ
wherein
Q is a carrier;
S 1 is a spacer;
L is -A-T-CH(X)-;
A is an amide linkage;
T is a bond or substituted or unsubstituted alkyl or alkenyl;
X is -(CH 2 ) k COOH;
k is an integer from 0 to 2;
Y is -COOH;
Z is -COOH; and
i is an integer from 0 to 4.
申请公布号
DE60111628(D1)
申请公布日期
2005.07.28
申请号
DE2001611628
申请日期
2001.04.10
申请人
SIGMA-ALDRICH CO., HIGHLAND
发明人
KAPPEL, WILLIAM K.;VISWANATHA, VENKATAPPA;LI, HANDONG;MEHIGH, RICHARD J.;DAPRON, JOHN G.
