发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND INTERMEDIATE STRUCTURE USED THEREIN
摘要 PROBLEM TO BE SOLVED: To restrain a supported semiconductor wafer from being broken in transfer, for example, of an intermediate structure wherein a supporting disc is stuck to the semiconductor wafer. SOLUTION: The manufacturing method of a semiconductor device has a process for reducing the diameter of a semiconductor wafer 32 of a diameter (L1) which can be treated in an existing installation, a process for sticking the semiconductor wafer 32 whose diameter is reduced to a semiconductor wafer supporting disc 22 having a diameter (L2) which can be treated in an existing installation and a process for treating the semiconductor wafer 32 stuck to the semiconductor wafer supporting disc 22. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005203554(A) 申请公布日期 2005.07.28
申请号 JP20040008148 申请日期 2004.01.15
申请人 TOYOTA MOTOR CORP 发明人 YAMAZAKI SHINYA;KIKUNI MASAHIRO;YAMASHITA NAOYUKI;WATANABE KATSUHIKO
分类号 H01L21/683;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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