发明名称 |
ELECTRON BEAM EXPOSURE SYSTEM |
摘要 |
<p>The invention relates to an electron beam generator for generating an electron beam, comprising an electron source and an extractor. The combination of electron source and extractor in use forms a negative lens, wherein said extractor has a positive voltage with respect to the source. The extractor and the electron source are positioned such that, in use, a space charge limited region is present between them. In an embodiment, the extractor is a planar extractor. In another embodiment, the source is a thermionic source.. The generator may comprise an illumination system for collimating the electron beam.</p> |
申请公布号 |
EP1556881(A2) |
申请公布日期 |
2005.07.27 |
申请号 |
EP20030809889 |
申请日期 |
2003.10.30 |
申请人 |
MAPPER LITHOGRAPHY IP B.V. |
发明人 |
WIELAND, MARCO JAN-JACO;KAMPHERBEEK, BERT JAN;VAN VEEN, ALEXANDER HENDRIK VINCENT;KRUIT, PIETER |
分类号 |
H01J37/302;A61N5/00;B82Y10/00;B82Y40/00;G01Q30/02;G01Q30/08;G03B1/00;G03F7/20;H01J3/02;H01J37/06;H01J37/08;H01J37/30;H01J37/304;H01J37/317;(IPC1-7):H01J37/302 |
主分类号 |
H01J37/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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