| 发明名称 |
Process and dispositive for manufacturing a catalytique layer |
| 摘要 |
The deposition under vacuum of a catalytic layer on a gas electrode (4) in an enclosure (31) is assisted by ionic bombardment of the electrode during the deposition of the catalyst. An independent claim is also included for a device for the deposition of a catalytic layer on a gas electrode. |
| 申请公布号 |
EP1557480(A2) |
申请公布日期 |
2005.07.27 |
| 申请号 |
EP20040293083 |
申请日期 |
2004.12.22 |
| 申请人 |
SAGEM DEFENSE SECURITE |
发明人 |
TIGREAT, DELPHINE;BERGAMASCO, JEAN-LUC;BOUTIN, XAVIER;LETOURNEUR, BRUNO |
| 分类号 |
C23C14/00;C23C14/22;C23C14/30;C23C14/34;C23C14/46;C23C14/54;H01M4/86;H01M4/88;H01M4/90;H01M4/92;H01M8/10;H01M8/12 |
主分类号 |
C23C14/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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