发明名称 |
SUBSTRATE HAVING MULTILAYER FILM AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. <??>A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from -100 MPa to +100 MPa. <IMAGE>
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申请公布号 |
EP1557479(A1) |
申请公布日期 |
2005.07.27 |
申请号 |
EP20030758772 |
申请日期 |
2003.10.22 |
申请人 |
ASAHI GLASS COMPANY LTD. |
发明人 |
YAMADA, TOMOHIRO,;SHIDOJI, EIJI,;MITSUI, AKIRA,;OYAMA, TAKUJI,;KAMIYAMA, T., |
分类号 |
C23C14/08;C23C14/10;C23C14/34;C23C16/40;C23C16/505;C23C28/04;G02B1/11;G02B5/28;(IPC1-7):C23C14/08 |
主分类号 |
C23C14/08 |
代理机构 |
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地址 |
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