| 摘要 |
In a method of manufacturing a thin film battery in a chamber, a target comprising LiCoO<SUB>2 </SUB>is provided on a magnetron cathode in the chamber, and a substrate is placed facing the target. A process gas is introduced into the chamber and the process gas is energized to form a plasma to sputter the target to deposit LiCoO<SUB>2 </SUB>on the substrate. An ion flux of from about 0.1 to about 5 mA/cm<SUP>2 </SUP>is delivered from the plasma to the substrate to enhance the crystallinity of the deposited LiCoO<SUB>2 </SUB>material on the substrate. The process gas is exhausted from the chamber. The target can also be made of other materials.
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