| 摘要 |
A semiconductor device includes a semiconductor substrate, an insulating layer, an inductor, a guard ring and a potential-applying line. The insulating layer is formed on the semiconductor substrate. The inductor is formed on the insulating layer. The guard ring is formed in the semiconductor substrate, surrounding the inductor and being a closed ring composed of waving segments connected, end to end. The potential-applying line applies a predetermined potential to the guard ring.
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