发明名称 |
Inspection device and method for manufacturing the same, method for manufacturing electro-optic device and method for manufacturing semiconductor device |
摘要 |
An inspection device includes a substrate; a stress relieving layer that is provided on the substrate; a contact that is provided on the stress relieving layer; and a wiring pattern that is electrically connected to the contact. Furthermore, method for manufacturing an inspection device includes the steps of: providing a substrate; forming a stress relieving layer on a surface of the substrate; forming a wiring pattern extending over the stress relieving layer on the surface of the substrate; and forming a contact on the wiring pattern in an area above the stress relieving layer.
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申请公布号 |
US2005156313(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
US20040023979 |
申请日期 |
2004.12.28 |
申请人 |
HASHIMOTO NOBUAKI |
发明人 |
HASHIMOTO NOBUAKI |
分类号 |
G01R1/073;G01R1/04;G01R3/00;G01R31/26;G02F1/13;G02F1/136;G09G3/00;H01L21/48;H01L21/66;H01L23/48;(IPC1-7):H01L23/48 |
主分类号 |
G01R1/073 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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