COATER/DEVELOPER AND COATING/DEVELOPING METHOD

摘要

A coater/developer in which entrance of water is prevented while maintaining a high throughput when a substrate is developed after it is coated with resist and immersion-exposed. A substrate coated with resist and immersion-exposed is mounted on a substrate mounting part, and then the liquid adhering to the surface of the substrate and forming at least a liquid layer is detected by a liquid detecting section. It is judged whether or not the substrate is dried from the results of the detection by the liquid detecting section, and a substrate judged to be dried is dried by a drying means. With such an arrangement, entrance of water into the apparatus can be prevented and a high throughput can be maintained because only a substrate needing to be dried is dried.