| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device restrained from power loss caused by waste of supplied microwave due to unwanted discharge. <P>SOLUTION: The plasma processing device comprises a shower plate 6 having a plurality of discharge holes 5 discharging gas, a microwave antenna, and a cover plate 8 arranged between the shower plate 6 and the microwave antenna. The specific dielectric of the cover plate is 8, and that of the shower plate is 9.8, and the variation of the specific dielectric through a space 10 having a specific dielectric of 1.0 is reduced, by the above, the electric field strength of the microwave is reduced. Further, edges of the dielectrics in a convex part of the space 10 are eliminated by forming the protrusions 11 into circular cylinder shape, by the above, local concentration of electric field is restrained, and abnormal discharge in the space 10 is restrained. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
