发明名称 ADDITIVE FOR ELECTROLYTIC COPPER PLATING, AND ELECTROLYTIC COPPER PLATING BATH
摘要 PROBLEM TO BE SOLVED: To provide an additive for electrolytic copper plating, which makes an article adequately plated with copper by effectively inhibiting voids from forming even in a part to be plated with a high aspect ratio, and to provide an electrolytic copper plating bath. SOLUTION: The additive for electrolytic copper plating and the electrolytic copper plating bath include (A) one or more brighteners for copper plating having at least one -S- bond, and (B) one or more sulfonic acids (salts), while controlling them to a mass ratio of (A):(B)=80:20 to 15:85. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005194608(A) 申请公布日期 2005.07.21
申请号 JP20040004513 申请日期 2004.01.09
申请人 ASAHI DENKA KOGYO KK 发明人 SHIBATA TOSHIHIRO;TAKAGI HIROTOSHI
分类号 C25D3/38;C25D7/00;C25D7/12;H01L21/288;(IPC1-7):C25D3/38 主分类号 C25D3/38
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