发明名称 |
Method of forming a mask pattern on a substrate |
摘要 |
A method of forming a two-dimensional mask pattern on a substrate ( 1 ). The method comprises: (a) printing a non-electrically conductive material ( 2 ) on a substrate in a coarse version of a desired mask pattern ( 3 A- 3 D); and (b) selectively ablating a portion ( 3 B) of the material using a laser to refine the coarse pattern to form the desired mask pattern.
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申请公布号 |
US2005158668(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
US20050036067 |
申请日期 |
2005.01.14 |
申请人 |
FUJIFILM ELECTRONIC IMAGING LTD. |
发明人 |
BITTNER CHRISTOP;GOUCH MARTIN P.;BROMLEY NIGEL I. |
分类号 |
G03F1/08;H05K3/00;H05K3/04;H05K3/06;H05K3/12;H05K3/28;(IPC1-7):G03F7/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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