发明名称 Method of forming a mask pattern on a substrate
摘要 A method of forming a two-dimensional mask pattern on a substrate ( 1 ). The method comprises: (a) printing a non-electrically conductive material ( 2 ) on a substrate in a coarse version of a desired mask pattern ( 3 A- 3 D); and (b) selectively ablating a portion ( 3 B) of the material using a laser to refine the coarse pattern to form the desired mask pattern.
申请公布号 US2005158668(A1) 申请公布日期 2005.07.21
申请号 US20050036067 申请日期 2005.01.14
申请人 FUJIFILM ELECTRONIC IMAGING LTD. 发明人 BITTNER CHRISTOP;GOUCH MARTIN P.;BROMLEY NIGEL I.
分类号 G03F1/08;H05K3/00;H05K3/04;H05K3/06;H05K3/12;H05K3/28;(IPC1-7):G03F7/00 主分类号 G03F1/08
代理机构 代理人
主权项
地址