发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<p>A semiconductor device having a high-quality ferroelectric capacitor wherein deterioration of the ferroelectric capacitor is prevented by preventing diffusion of hydrogen or H2O is disclosed. The semiconductor device comprising a ferroelectric capacitor formed on a substrate and a wiring structure formed on the ferroelectric capacitor is characterized in that the wiring structure comprises an interlayer insulating layer and a Cu wiring portion formed in the interlayer insulating layer and that an etching stopper layer including a hydrogen diffusion-preventing layer is so formed as to face the interlayer insulating layer.</p> |
申请公布号 |
WO2005067051(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
WO2003JP16986 |
申请日期 |
2003.12.26 |
申请人 |
FUJITSU LIMITED;IZUMI, KAZUTOSHI |
发明人 |
IZUMI, KAZUTOSHI |
分类号 |
H01L21/02;H01L27/10;H01L27/105;(IPC1-7):H01L27/10 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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