发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>A semiconductor device having a high-quality ferroelectric capacitor wherein deterioration of the ferroelectric capacitor is prevented by preventing diffusion of hydrogen or H2O is disclosed. The semiconductor device comprising a ferroelectric capacitor formed on a substrate and a wiring structure formed on the ferroelectric capacitor is characterized in that the wiring structure comprises an interlayer insulating layer and a Cu wiring portion formed in the interlayer insulating layer and that an etching stopper layer including a hydrogen diffusion-preventing layer is so formed as to face the interlayer insulating layer.</p>
申请公布号 WO2005067051(A1) 申请公布日期 2005.07.21
申请号 WO2003JP16986 申请日期 2003.12.26
申请人 FUJITSU LIMITED;IZUMI, KAZUTOSHI 发明人 IZUMI, KAZUTOSHI
分类号 H01L21/02;H01L27/10;H01L27/105;(IPC1-7):H01L27/10 主分类号 H01L21/02
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