REFERENCE DATA GENERATION METHOD, PATTERN DEFECT INSPECTION DEVICE, PATTERN DEFECT INSPECTION METHOD, AND REFERENCE DATA GENERATION PROGRAM

摘要

PROBLEM TO BE SOLVED: To generate accurate reference data having a high degree of consistency with sensor data in a short operation time, and to improve inspection accuracy.

SOLUTION: This pattern defect inspection device for inspecting a pattern defect is operated as follows: binary or multi-value gradation data of a pixel unit are generated from design data; the gradation value of an aimed pixel in the gradation data is multiplied by the first coefficient corresponding to the gradation value of a near pixel to the aimed pixel to generate the first processing data; the gradation value of a pixel in the first processing data is rounded up by the first threshold to generate the second processing data; the gradation value of a pixel in the second processing data is rounded off by the second threshold to generate the third processing data; the gradation value of a pixel in the third processing data is multiplied by the second coefficient to generate the fourth processing data; and reference data based on the fourth processing data is compared with the sensor data acquired by imaging the pattern.

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