| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an external appearance inspection device which can detect the defect of a reticle with high sensitivity. <P>SOLUTION: The external appearance inspection device is provided with; an image input part 1 which optically scans a mask which is an inspection object and outputs input image data 5a; a reference image generation part 2 which generates reference image data 5c from design data 5b relating to the pattern of a reticle; a searching part 3 which searches regions of the same form on the reference image data 5c; and a comparison part 4 which compares and collates regions corresponding to the regions of the same form searched by the searching part 3 on the input image data 5a. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
