| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing method capable of enhancing the accuracy of prediction or the like of a processing result by a plasma processing apparatus, and relieving a load required for production of a model. <P>SOLUTION: A measured data storage 202 stores measured data Xa, Xb under referenced operating conditions A, B, an analysis processing result storage 210 stores models Ka, Kb generated by the multivariate analysis; the measured data storage 202 stores measured data Xp under a new operating condition P; and an analysis processing section 208 respectively multiplies weight coefficients Wa, Wb with the measured data Xa and Xb and adds the measured data Xp to the products to obtain weighted measured data and the weight coefficients Wa, Wb, respectively multiplies the weight coefficients Wa, Wb with the models Ka, Kb, and sums the products to obtain a model Kp on the basis of the new operating condition P. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
