发明名称 |
MEASURING METHOD FOR LINE-AND-SPACE PATTERN USING SCANNING ELECTRON MICROSCOPE |
摘要 |
PROBLEM TO BE SOLVED: To easily and quickly measure an average line width of a line-and-space pattern, without conducting measurement in a large number of positions. SOLUTION: The average line width, an average space width and an average pitch width are calculated based on a peak interval of an own correlation value in a differential image of the line-and-space pattern, and based on a peak interval corresponding to a line edge on a projection data of the differential image. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005195361(A) |
申请公布日期 |
2005.07.21 |
申请号 |
JP20030435519 |
申请日期 |
2003.12.26 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
TAKANE ATSUSHI;MAEDA TATSUYA;IIIZUMI TAKASHI |
分类号 |
G01B15/00;G01B15/04;G06K9/36;G06K9/48;(IPC1-7):G01B15/00 |
主分类号 |
G01B15/00 |
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地址 |
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