发明名称 MEASURING METHOD FOR LINE-AND-SPACE PATTERN USING SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To easily and quickly measure an average line width of a line-and-space pattern, without conducting measurement in a large number of positions. SOLUTION: The average line width, an average space width and an average pitch width are calculated based on a peak interval of an own correlation value in a differential image of the line-and-space pattern, and based on a peak interval corresponding to a line edge on a projection data of the differential image. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005195361(A) 申请公布日期 2005.07.21
申请号 JP20030435519 申请日期 2003.12.26
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TAKANE ATSUSHI;MAEDA TATSUYA;IIIZUMI TAKASHI
分类号 G01B15/00;G01B15/04;G06K9/36;G06K9/48;(IPC1-7):G01B15/00 主分类号 G01B15/00
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