发明名称 |
PRODUCTION METHOD FOR GROUP III NITRIDE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a group III nitride crystal with a large area and a low dislocation at an increased growth rate. SOLUTION: The production method causes a group III nitride crystal to grow on a substrate 2 by supplying the vapor 4a of a group III element and the vapor 5a of an alkali metal into a nitrogen-containing atmosphere wherein the substrate 2 is placed. Here a first vessel 3a and a second vessel 3b are installed in the above atmosphere; the vapor 4a of the group III element is generated from a melt 4 of the group III element housed in the first vessel 3a; and the vapor 5a of the alkali metal is generated from a melt 5 of the alkali metal housed in the second vessel 3b. COPYRIGHT: (C)2005,JPO&NCIPI
|
申请公布号 |
JP2005194147(A) |
申请公布日期 |
2005.07.21 |
申请号 |
JP20040003293 |
申请日期 |
2004.01.08 |
申请人 |
SUMITOMO ELECTRIC IND LTD;MORI YUSUKE |
发明人 |
SASAKI TAKATOMO;MORI YUSUKE;YOSHIMURA MASASHI;KAWAMURA SHIRO;HIROTA TATSU |
分类号 |
C01B21/06;C23C16/34;C30B23/00;C30B29/38;(IPC1-7):C30B29/38 |
主分类号 |
C01B21/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|