发明名称 PRODUCTION METHOD FOR GROUP III NITRIDE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a group III nitride crystal with a large area and a low dislocation at an increased growth rate. SOLUTION: The production method causes a group III nitride crystal to grow on a substrate 2 by supplying the vapor 4a of a group III element and the vapor 5a of an alkali metal into a nitrogen-containing atmosphere wherein the substrate 2 is placed. Here a first vessel 3a and a second vessel 3b are installed in the above atmosphere; the vapor 4a of the group III element is generated from a melt 4 of the group III element housed in the first vessel 3a; and the vapor 5a of the alkali metal is generated from a melt 5 of the alkali metal housed in the second vessel 3b. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005194147(A) 申请公布日期 2005.07.21
申请号 JP20040003293 申请日期 2004.01.08
申请人 SUMITOMO ELECTRIC IND LTD;MORI YUSUKE 发明人 SASAKI TAKATOMO;MORI YUSUKE;YOSHIMURA MASASHI;KAWAMURA SHIRO;HIROTA TATSU
分类号 C01B21/06;C23C16/34;C30B23/00;C30B29/38;(IPC1-7):C30B29/38 主分类号 C01B21/06
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