| 摘要 |
A photosensitive resin composition for a black matrix comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) a solvent; and (E) a black pigment; wherein the alkali-soluble resin (A) comprises a functional group having a general formula (a-1); viscosity of said photosensitive resin composition for the black matrix is 0.5-4.0 cps at 25° C.; the solid content of said photosensitive resin composition is 5-25 wt. %; and said solvent (D) has a saturated vapor pressure below 4.5 mm-Hg at 20° C.; which presents no pinhole on the surface after low pressure drying, no line and cloud defect on the film, good inner uniformity of the coated film and high photosensitivity after pre-bake, high heat resistance for black matrix after post-bake; which can be coated on the substrate, specifically the large-sized substrate, of liquid crystal display by the slit coating process. (Each of R is independently H, linear or branch alkyl of C1-C5, phenyl or halogen.)
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