发明名称 |
Radiation sensitive composition, microlens, process for forming microlens and use of the microlens |
摘要 |
A radiation sensitive composition containing inorganic oxide particles; a copolymer of at least one unsaturated compound selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride and other unsaturated compound different from the unsaturated compound; a polyfunctional unsaturated compound having at least two ethylenically unsaturated groups in the molecule; and a radiation sensitive polymerization initiator. The composition is useful for making a microlens.
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申请公布号 |
US2005157399(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
US20040011091 |
申请日期 |
2004.12.15 |
申请人 |
JSR CORPORATION |
发明人 |
HANAMURA MASAAKI |
分类号 |
G02B3/00;G02F1/1335;G03F7/00;G03F7/004;G03F7/033;G03F7/40;(IPC1-7):B32B27/20;B32B27/30;G02B1/10 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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