DIAPHRAGM VALVE FOR ATOMIC LAYER DEPOSITION

摘要

Diaphragm valves (200) for use in an atomic layer deposition (ALD) system are disclosed. In one embodiment, a heating body (290) forms a thermally conductive pathway between the diaphragm (220) and the valve body (210) to help maintain an operating temperature at the diaphragm and inhibit condensation or freezing of high-temperature ALD precursor gases in the valve passage (214). In another embodiment, a pressure vent (302, 306, 310) communicating with an enclosed space (296) behind the diaphragm reduces resistance to transitioning of the diaphragm between the open and closed positions. In some implementations, a pump or other source of suction (316) is coupled to the pressure vent to reduce fluid pressure in the enclosed space. In yet another embodiment, a valve seat (230) includes an annular seating surface that surrounds an inlet (216) of the valve and contacts a substantial portion of one side of the diaphragm when closed, to facilitate heat transfer and counteract dissipative cooling of the diaphragm.