| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition for improving fine resolution, LER and depth of focus, and to provide a method for forming a resist pattern which uses the resist composition. <P>SOLUTION: The resist composition contains (A) a resin component whose alkali solubility is changed by the action of acid, and (B) an acid generator component which generates an acid through exposure, wherein the component (A) is a resin with a mass average molecular weight of ≤8,000 which contains a constitutional unit (a) derived from a (meth)acrylate, and the component (B) contains at least one kind of sulfonium compound, represented by general formula (b-1) or (b-2). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
