发明名称 METHOD AND MASK FOR EVALUATING CHARGED PARTICLE BEAM TRANSFER DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method and a mask for evaluating a charged particle beam transfer device capable of evaluating in-plane uniformity of Coulomb effect easily and surely in the charged particle beam transfer device. <P>SOLUTION: A pattern to be transferred to a subfield region is divided into a plurality of sub-regions smaller than the subfield region, each of the plurality of sub-regions is assigned to any one of first and second complementary masks, and each of the plurality of sub-regions is assigned to any one of third and fourth complementary masks differently from the first and second complementary masks. Subsequently, the results of transferring a pattern to a body being irradiated by complementary exposure using the first and second complementary masks is compared with the results of transferring a pattern to a body being irradiated by complementary exposure using the third and fourth complementary masks. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005197477(A) 申请公布日期 2005.07.21
申请号 JP20040002453 申请日期 2004.01.07
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 YAMAMOTO JIRO
分类号 G03F1/20;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/20
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