| 发明名称 |
MANUFACTURING METHOD OF OPTICAL MASK FOR CRYSTALLIZATION, AND THIN-FILM TRANSISTOR DISPLAY PANEL UTILIZING THE SAME |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an optical mask for crystallization and a thin-film transistor indicating panel which utilizes it, in which the characteristics of a thin-film transistor can be ensured uniformly. <P>SOLUTION: The optical mask for crystallization includes one or more slit regions, in which the slits are arranged uniformly, and the slits are provided so as to incline by a fixed angle with respect to the moving direction of the mask. The slit region includes a first part, having a first length and a second part, having a second length larger than the first length. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
| 申请公布号 |
JP2005197746(A) |
申请公布日期 |
2005.07.21 |
| 申请号 |
JP20050001267 |
申请日期 |
2005.01.06 |
| 申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
CHUNG UI-JIN;KANG MYUNG-KOO;LEE JAE-BOK |
| 分类号 |
H01L29/786;B23K26/06;G02F1/1368;G03F1/00;G09F9/00;H01L21/027;H01L21/20;H01L21/268;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/788;(IPC1-7):H01L21/268;G02F1/136 |
主分类号 |
H01L29/786 |
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