MICRO FUNCTION ELEMENT, MANUFACTURING METHOD THEREOF, CIRCUIT BOARD, MANUFACTURING METHOD THEREOF, ELECTRONIC APPLICATION DEVICE, AND MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a micro function element that easily uniforms characteristics and can be handled easily, and to provide a method for manufacturing the micro function element. SOLUTION: A first silicon layer for forming a channel region is formed on a silicon substrate for forming a source or drain region, a second silicon layer for forming the drain or source region is formed on the first silicon layer, and anisotropic etching is performed on the second and first silicon layers and the silicon substrate for patterning in a prescribed shape for forming a plurality of columnar structures. Hence, the columnar structures are separated mutually, thus manufacturing the transistor having at least one function element in the columnar structure 11 of which the minimum diameter is larger than 0.5μm and length is longer than 1μm. COPYRIGHT: (C)2005,JPO&NCIPI