发明名称 BIPOLAR TRANSISTOR, SEMICONDUCTOR DEVICE THEREWITH, AND THESE MANUFACTURING METHODS
摘要 PROBLEM TO BE SOLVED: To reduce base resistance, as well as to prevent the variation in the current gain of a bipolar transistor, by an easy method. SOLUTION: After forming a base layer on a semiconductor substrate, an opening for taking out a base electrode and an opening for taking out an emitter electrode are simultaneously formed in an insulator layer laminated on the base layer. Subsequently, a section for taking out the base electrode is formed in the opening for taking out the base electrode, and a section for taking out the emitter electrode is formed in the opening for taking out the emitter electrode. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005197580(A) 申请公布日期 2005.07.21
申请号 JP20040004186 申请日期 2004.01.09
申请人 SONY CORP 发明人 BAIRO MASAAKI
分类号 H01L21/28;H01L21/265;H01L21/331;H01L21/8222;H01L21/8248;H01L21/8249;H01L27/06;H01L29/10;H01L29/417;H01L29/423;H01L29/732;H01L29/737;(IPC1-7):H01L21/331;H01L21/822;H01L21/824 主分类号 H01L21/28
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