DEVELOPING METHOD IN PROCESS OF MANUFACTURING SEMICONDUCTOR DEVICE AND DEVELOPING DEVICE EXECUTING THIS

摘要

PROBLEM TO BE SOLVED: To provide a developing device and developing method, wherein in a cleaning and drying process after the photoresist on a semiconductor substrate is developed, no defects occur in a photoresist pattern. SOLUTION: After the photoresist on the semiconductor substrate is developed, the semiconductor substrate is rotated at rotation speeds of two stages consisting of a low speed and a middle speed to execute a cleaning process, and the semiconductor substrate is rotated at the rotation speed which is extremely lower than a low speed rotation, so that a paddle of pure water on the semiconductor substrate is formed. Thereafter, the semiconductor substrate is rotated at a higher speed than the middle speed rotation, to execute a drying process. COPYRIGHT: (C)2005,JPO&NCIPI