| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor for preventing a rotary shaft 218 or a seal means 340 from being exposed to treatment gas. SOLUTION: This substrate processor is provided with a treatment chamber in which a substrate is stored and processed, a substrate holding means for holding the substrate in the treatment chamber and an exhaust port opened to the treatment chamber. The treatment chamber includes a substrate storage space including the exhaust port in which the substrate is stored and a non-substrate storage space, and comprises a diffusion preventing body for preventing the atmosphere of the substrate storage space from flowing to the non-substrate storage space between the substrate storage space and the non-substrate storage space and an inactive gas supply means for supplying inactive gas to the non-substrate storage space. The inert gas is sent out from the exhaust port. COPYRIGHT: (C)2005,JPO&NCIPI
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