发明名称 EXCIMER LIGHT IRRADIATION EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To enable good excimer discharge by increasing the contact area between an electrode and a dielectric, and thus to eliminate illuminance unevenness of the irradiation light to provide a uniform illuminance distribution on a processed surface, in excimer light irradiation equipment where excimer discharge is formed between electrodes placed opposed to each other via the dielectric in a housing filled with an excimer generation gas. SOLUTION: The excimer light irradiation equipment comprises the housing having a light taking-out window in the light emission direction, and the opposed electrodes via the dielectric in this housing, where excimer discharge is produced between opposed electrodes. At least one of the opposed electrodes and the dielectric have screw parts, each of which is screwed with the other. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005197076(A) 申请公布日期 2005.07.21
申请号 JP20040001763 申请日期 2004.01.07
申请人 USHIO INC 发明人 MATSUZAWA SOJI;SUMITOMO TAKU;HISHINUMA NOBUYOSHI
分类号 H01J65/00;(IPC1-7):H01J65/00 主分类号 H01J65/00
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