发明名称 |
Erosion mitigation for collector optics using electric and magnetic fields |
摘要 |
A magnetic and/or electric field may be generated around collector optics in an EUV lithography system to deflect debris particles from the reflective surfaces of the optics. The magnetic and/or electric field may be generated by a solenoid structure around the optics or by passing current through inner an outer shells in a nested shell arrangement.
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申请公布号 |
US2005155624(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
US20040759344 |
申请日期 |
2004.01.15 |
申请人 |
LEE SANG H.;BRISTOL ROBERT;RAMAMOORTHY ARUN |
发明人 |
LEE SANG H.;BRISTOL ROBERT;RAMAMOORTHY ARUN |
分类号 |
B08B6/00;G03F7/20;H01L21/027;(IPC1-7):B08B6/00 |
主分类号 |
B08B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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