发明名称 |
Lithography mask comprises a structure for transferring a layout onto a substrate, with a blind macrostructure to suppress scattered light |
摘要 |
A lithography mask comprises a structure for transferring a layout onto a substrate. A blind macrostructure (1) is used to suppress scattered light, and is located at a bright region of the structure. The macrostructure is partially transparent and does not print on the substrate or form a resist structure. |
申请公布号 |
DE10361875(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
DE2003161875 |
申请日期 |
2003.12.19 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
PFORR, RAINER;MUELDERS, THOMAS;CRELL, CHRISTIAN;BAUCH, LOTHAR;ZIEBOLD, RALF;MOELLER, HOLGER;GRAESER, ANNETT |
分类号 |
G03F1/00;G03F1/36 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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