| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a charged-particle exposure device and exposure method measuring and adjusting a position, a rotation, a scale factor, an orthogonal degree, a focal point, an astigmatism, a blur or the like of a lighting beam with a high accuracy at every sub-field. <P>SOLUTION: A mark plate 11, to which rectangular marks (lighting-beam calibration marks) 101 along each side of the image IB' of the lighting beam is formed, is mounted on a reticle stage. The lighting beam and the calibration marks 101 are scanned relatively. One or more of the position of the lighting beam, the rotation, the orthogonal degree, the focal point, the out of the focussing and the astigmatism are measured from a signal obtained by detecting a physical phenomenon generated by the superposition of the beam and the marks, the first-stage differential signal of the signal or the second-stage differential signal in this case. The lighting beam is adjusted on the basis of a measured result. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
