EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD

摘要

An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through a liquid (LQ) supplied from a liquid supply mechanism (10) and through a projection optical system (PL). The exposure apparatus (EX) has a pressure regulation mechanism (90) for regulating pressure of the liquid (LQ) supplied from the liquid supply mechanism (10). A liquid immersion region is excellently formed to obtain high exposure accuracy and measurement accuracy.