| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target for forming a transparent electroconductive film that has five or more protrusions with a height of 20 nm or higher per unit square micrometer on the surface, and satisfies resistivity, heat resistance and moisture resistance, which are required to the transparent electroconductive film used for a touch panel. <P>SOLUTION: The sputtering target is made by using a sintered compact that consists of substantially indium, tin, magnesium and oxygen, and that comprises an In<SB>4</SB>Sn<SB>3</SB>O<SB>12</SB>phase having a fluorite structure of an intermediate compound of indium oxide and stannic oxide, and an In<SB>2</SB>O<SB>3</SB>phase having a bixbyte structure, so that the integrated intensity of an X-ray diffraction peak on a face (220) in the former can be 40% or higher of that on a face (211) in the latter. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
