发明名称 |
Planarization method of patterning a substrate |
摘要 |
The present invention includes a method for forming a pattern on a substrate with a composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. The method includes depositing the composition to function as a planarization layer. Thereafter, a layer of polymerizable material into which a pattern is to be recorded is deposited.
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申请公布号 |
US2005156357(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
US20040026821 |
申请日期 |
2004.12.30 |
申请人 |
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
WILLSON C. G.;SMITH BRITAIN J.;STACEY NICHOLAS A. |
分类号 |
C08F2/46;G03F7/095;(IPC1-7):B29C35/08;B29C59/02 |
主分类号 |
C08F2/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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