发明名称 |
A LOW OUTGASSING AND NON-CROSSLINKING SERIES OF POLYMERS FOR EUV NEGATIVE TONE PHOTORESISTS |
摘要 |
A series structure of a chemically amplified negative tone photoresist that is not based on cross-linking chemistry is herein described. The photoresist may comprise: a first aromatic structure copolymerized with a cycloolefin, wherein the cycloolefin is functionalized with a di-ol. The photoresist may also include a photo acid generator (PAG). When at least a portion of the negative tone photoresist is exposed to light (EUV or UV radiation), the PAG releases an acid, which reacts with the functionalized diol to rearrange into a ketone or aldehyde. Then new ketone or aldehyde is less soluble in developer solution, resulting in a negative tone photoresist. |
申请公布号 |
WO2005066715(A2) |
申请公布日期 |
2005.07.21 |
申请号 |
WO2004US43684 |
申请日期 |
2004.12.23 |
申请人 |
INTEL CORPORATION;YUEH, WANG;CAO, HEIDI;CHANDHOK, MANISH |
发明人 |
YUEH, WANG;CAO, HEIDI;CHANDHOK, MANISH |
分类号 |
G03F7/038 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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